cylindrical, planar magnetron sputtering target strengths

Cylindrical, planar magnetron sandblasted tungsten target target working conditions compared with the rectangular target The surface of the rectangular target in the target plane to form a closed annular glow belt, with the consumption target, the target is formed on the surface of the annular region corresponds glow corrosion pits (see Figure 8).Cylindrical, planar magnetron sputtering target formed on the surface of the target groups (four) symmetrical glow with a closed ring, with the consumption target, the target surface is formed in the region corresponding to the glow ring like corrosion pit (Figure 9).6 cylindrical, planar magnetron sputtering target strengthsAnd other forms of magnetron sputtering target compared to cylindrical, planar magnetron sputtering target in the target coating retains rectangular plane while the merits of good uniformity, through the following two ways of maximizing target efficiency, (1) when the target surface group 2 (four) annular depression reaches a certain depth, the core may be the target (magnet part) relative to target tube rotated 45 °, so that the target can not corrode the other tube area over utilization; (2) when the cylindrical, planar magnetron sputtering target of the target to turn the target cell core design, the (rotary sputtering target cell), the target surface may be a uniform layer sputtered away, and no pit, time, target will be the most effective use, target utilization of 50% to 60%. When the target for the precious metal material, which is undoubtedly of great significance [2].7 ConclusionBy using coaxial cylindrical magnetron sputtering target magnet and boots ends ofthe magnetic field theory to solve the problem, you can evolve into a rectangular planar target cylindrical, planar magnetron sputtering target. The target to retain a rectangular plane target coating uniformity good case, to maximize target utilization. Thereby enhancing economic efficiency.