Cylindrical, planar magnetron sputtering target design ideas

4.1 Principle
A rectangular planar Molybdenum plate target structure principle is applied to the cylindrical magnetron sputtering target, the design of cylindrical magnetron sputtering target is called, planar magnetron sputtering target. It combines a flat rectangular coaxial cylindrical target and the target of both worlds. The coating uniformity, and target utilization is higher.
The two rectangular planar targets around the X axis (see Figure 2) curled in a semicircle, and co-interference, shown in Figure 5, the initial completion of a flat rectangular targeting cylindrical, planar magnetron sputtering target evolution. X-axis becomes the axis line, the magnetic field lines of the cylinder 4 is formed on the surface of the closed space, the secondary electrons bound the plasma region e1 movement.
4.2 To solve the technical problem
In the rectangular planar target evolved into a cylindrical, planar target process, the rectangular planar target are arranged along the X-axis direction of the magnet into a cylindrical, planar-type distribution of the target in the axial direction of the magnets. The rectangle in the target plane perpendicular to the X-axis-side ends of the magnet A theory, should the ring A into a circular magnet, and its magnetization direction should be the inner surface and the outer surface of the ring, the inner and outer surfaces should be separately S pole and N pole, as shown in Figure 6. However, this method is almost magnetizing is impossible. Therefore, the design cylindrical, planar magnetron sputtering target, to solve the problem at both ends of the magnetic field is the key to success.